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Indian Institute of Science Bangalore

Fundamentals of micro and nanofabrication

Indian Institute of Science Bangalore and NPTEL via Swayam


The course provides an in-depth understanding of top-down device fabrication. Focus is the unit processes typically used in micro & nanofabrication of devices. Both concepts and practical aspects are covered. Topics include crystal growth, doping, chemical vapor deposition, physical vapor deposition, photolithography, wet etching, dry etching, and packaging. The course is accessible to students from diverse backgrounds, such as materials, physics, chemistry, mechanical engineering, and electrical engineering.The course will be a derivative of NE203: Advanced Micro & Nano Fabrication Technology & Processes. Students from various departments outside CeNSE, e.g. Physics, Chemistry, ECE, DESE, IAP, routinely take the course.INTENDED AUDIENCE : Masters students interested in fundamentals of top-down micro and nanodevice fabricationPREREQUISITES : General background in physics, chemistry, materials, chemical engineering, mechanical engineering,or electronic engineering should be enough.INDUSTRY SUPPORT : Electronic Device Manufacturing


Week 1:Introduction to micro-fabrication Week 2: Substrate Week 3: Cleaning Week 4: Additive processing: Doping Week 5: Additive processing: Native Films Week 6: Additive processing: CVD Week 7: Additive processing: PVD Week 8: Lithography 1 Week 9: Lithography 2 Week 10: Subtractive Process: Wet Etching Week 11: Subtractive Process: Dry Etching Week 12: CMP and Packaging

Taught by

Prof.Shankar Kumar Selvaraja & Prof. Sushobhan Avasti


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