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This course on Electron Beam Lithography aims to teach learners how to draw images using electrons with a scanning electron microscope. The course covers topics such as substrate choice, PMMA resist, e-beam resist mechanisms, development processes, dose dependence, resist thickness, accelerating voltage, proximity effects, emission current, and more. The teaching method includes a detailed syllabus with step-by-step explanations and demonstrations. This course is intended for individuals interested in learning about advanced lithography techniques and electron beam technology.
